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在神经假体系统中,神经微电极是实现信号检测以及激励任务的重要组成部分.然而,神经微电极由于尺寸微小,往往具有很高的电极/组织界面阻抗.本文提出了一种在电极位点表面处集成纳米结构来增大电极有效表面积的方法.这种方法结合了光刻、局部氧化铝以及电子束蒸发等技术,在薄膜微电极的表面集成了纳米金柱结构.最后,本文测试和评价了此微电极的表面形貌以及电学性能.实验结果表明,这种集成有纳米金柱结构的微电极其界面阻抗降低了约25倍,促进了这种微电极在神经工程领域的广泛应用.
In the neural prosthesis system, the neural microelectrode is an important part of the task of signal detection and excitation.However, due to its small size, the neural microelectrode often has a very high impedance at the electrode / The method of integrating nanostructures at the surface of a point to increase the effective surface area of the electrodes is a combination of lithography, local alumina and electron beam evaporation techniques to integrate the nano-gold pillar structure on the surface of the film microelectrode.Finally, And evaluated the surface morphology and electrical properties of the microelectrode.Experimental results show that the microelectrode with nano-gold-gold column structure reduces the interface impedance by about 25 times, which promotes the widespread application of the microelectrode in the field of neural engineering application.