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本文对弯曲通道凸壁面单排孔30°喷射时气膜冷却流场的近场特性作了比较精细的测量,测量的数据包括壁面静压分布、速度矢分布及气膜冷却有效温比分布。测量表明,弯曲通道凸壁面上30°喷射时对流场的干扰,在孔近场区是显著的,在孔下游约一倍孔径的范围内,流向及侧向的压力变化均甚大;而在进一步下游,主流绕流射流所产生的结构复杂的“绕流区”也是明显的.由于壁面曲率的影响,射流贴附壁面的程度,在M<1.0时,要优于平壁;而当M>1.0时,由于射流的“穿透”作用,其附壁程度又劣于平壁.在X/D>10之后,射流产生的扰动已趋衰减,射流的侧向扩散使流场的三维特征逐渐消失,而接近于二维连续缝槽气膜冷却流场的规律.在本试验条件下,M=0.5左右,可以获得最佳的气膜冷却效果。
In this paper, the near-field characteristics of the film cooling flow field when the single-row hole of the convex wall of the curved channel is sprayed by 30 ° are measured in detail. The measured data include the static pressure distribution, the velocity vector distribution and the effective temperature distribution of the film cooling. The measurement shows that the interference of the flow field at 30 ° on the convex wall of the curved channel is significant in the near-field region of the hole. Within the range of about one-time the pore diameter downstream, the pressure changes in both the flow direction and the lateral direction are very large. Further downstream, the main flow around the jet generated by the complex structure of the “flow around the area” is also obvious due to the curvature of the wall, the jet attached to the wall extent, M <1.0, is better than the flat wall; and when M > 1.0, the degree of attachment of the jet is inferior to that of the flat wall due to the “penetration” of the jet. After X / D> 10, the perturbations of the jet have decayed and the lateral diffusion of the jet has made the three- Gradually disappear, and close to the law of two-dimensional continuous film cooling film flow field in this test conditions, M = 0.5 or so, you can get the best film cooling effect.