利用介质阻挡放电原理 ,在自行研制的设备上进行了常压非平衡等离子体渗氮。研究表明 ,在等离子环境中 ,试样表面能迅速获得很深的渗层和白亮层 ,而电场外试样几乎无渗层。说明电场内气体电离率高 ,活性粒子浓度高。整个工艺过程操作简便 ,是一种很有发展前景的新工艺。 Using the dielectric barrier discharge principle, atmospheric non-equilibrium plasma nitriding was carried out on the self-developed equipment. The research shows that in the plasma environment, the surface of the sample can rapidly obtain the deep layer and the white layer, while the sample outside the electric field has almost no layer. Gas field ionization rate is high, high concentration of active particles. The entire process is easy to operate, is a promising new technology.